Improvement of laser molecular beam epitaxy grown SrTi O3 thin film properties by temperature gradient modulation growth

Applied Physics Letters

Volumn 91, Issue 13, 2007, Pages

  Li, Jin Long ^a   Hao, J H ^a   Li, Y R ^b  

^a HONG KONG POLYTECHNIC UNIVERSITY   (Hong Kong)

^b UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSION; MOLECULAR BEAM EPITAXY; OXYGEN; REFLECTION; STRONTIUM COMPOUNDS; TEMPERATURE DISTRIBUTION; X RAY DIFFRACTION ANALYSIS;

ENERGY ELECTRON DIFFRACTION; MODULATED MULTILAYERS; TEMPERATURE GRADIENT MODULATION GROWTH; X-RAY DIFFRACTION MEASUREMENTS;

THIN FILMS;

EID: 34848852932     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2790074     Document Type: Article

References (25)

1. A. I. Kingon, J.-P. Maria, and S. K. Streiffer, Nature (London) 406, 1031 (2000).
2. F. J. Walker and R. A. McKee, in High Dielectric Constant Materials: VLSI MOSFET Applications, edited by, H. R. Huff, and, D. C. Gilmer, (Springer, Berlin, 2005), Vol. 16, pp. 607-637.
3. C. J. Först, C. R. Ashman, K. Schwarz, and P. E. Blöchi, Nature (London) 427, 53 (2004).
4. F. Sánchez, R. Aguiar, V. Trtik, C. Guerrero, C. Ferrater, and M. Varela, J. Mater. Res. 13, 1422 (1998).
5. J. Q. He, S. Regnery, C. L. Jia, Y. L. Qin, F. Fitsilis, P. Ehrhart, R. Waser, K. Urban, and R. H. Wang, J. Appl. Phys. 92, 7200 (2002).
6. Z. Wamg, V. Kugler, U. Helmersson, N. Konofaos, E. K. Evangelou, S. Nakao, and P. Jin, Appl. Phys. Lett. 79, 1513 (2001).
7. T. Yamada, N. Wakiya, K. Shinozaki, and N. Mizutani, Appl. Phys. Lett. 83, 4815 (2003).
8. Y. Z. Yoo, P. Ahmet, Z. W. Jin, K. Nakajima, T. Chikyow, M. Kawasaki, Y. Konishi, Y. Yonezawa, J. H. Song, and H. Koinuma, Appl. Phys. Lett. 82, 4125 (2003).
9. L. V. Goncharova, D. G. Starodub, E. Garfunkel, T. Gustafsson, V. Vaithyanathan, J. Lettieri, and D. G. Schlom, J. Appl. Phys. 100, 1014912 (2006).
10. R. A. Mckee, F. J. Walker, and M. F. Chisholm, Phys. Rev. Lett. 81, 3014 (1998).
11. J. H. Hao, J. Gao, Z. Wang, and D. P. Yu, Appl. Phys. Lett. 87, 131908 (2005).
12. J. H. Hao, J. Gao, and H. K. Wong, Thin Solid Films 515, 559 (2006).
13. F. Sánchez, M. Varela, X. Queralt, R. Aguiar, and J. L. Morenza, Appl. Phys. Lett. 61, 2228 (1992).
14. O. Nakagawara, M. Kobayashi, Y. Yoshino, Y. Katayama, H. Tabata, and T. Kawai, J. Appl. Phys. 78, 7226 (1995).
15. X. Hu, H. Li, Y. Liang, Y. Wei, Z. Yu, D. Marshall, J. Edwards, Jr., R. Droopad, X. Zhang, A. A. Demkov, K. Moore, and J. Kulik, Appl. Phys. Lett. 82, 203 (2003).
16. V. Shutthanandan, S. Thevuthasan, Y. Liang, E. M. Adams, Z. Yu, and R. Droopad, Appl. Phys. Lett. 80, 1803 (2002).
17. Y. R. Li, J. L. Li, Y. Zhang, X. H. Wei, X. W. Deng, and X. Z. Liu, J. Appl. Phys. 96, 1640 (2004).
18. J. L. Li, Y. R. Li, Y. Zhang, X. W. Deng, F. Yang, W. Fei, J. Cryst. Growth 274, 612 (2005).
19. J. L. Li, Y. R. Li, J. Zhu, Y. Zhang, F. Yang, and W. Fei, J. Mater. Sci. 41, 3761 (2006).
20. Y. R. Li, J. L. Li, Z. Jun, Z. Ying, H. Z. Zeng, X. Wei, and J. L. Tang, Appl. Phys. Lett. 88, 152901 (2006).
21. F. Niu and B. W. Wessels, J. Cryst. Growth 300, 509 (2007).
22. G. Delhaye, C. Merckling, M. El-Kazzi, G. Saint-Girons, M. Gendry, Y. Robach, G. Hollinger, L. Largeau, and G. Patriarche, J. Appl. Phys. 100, 124109 (2006).
23. P. K. Petrova and N. M. Alford, Appl. Phys. Lett. 87, 222902 (2006).
24. I. Ohkubo, H. M. Christen, S. V. Kalinin, G. E. Jellison, Jr., C. M. Rouleau, and D. H. Lowndes, Appl. Phys. Lett. 84, 1350 (2004).
25. S. W. Jiang, Q. Y. Zhang, Y. R. Li, Y. Zhang, X. F. Sun, and B. Jiang, J. Cryst. Growth 274, 500 (2005).