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Journal of Materials Science

Volumn 41, Issue 12, 2006, Pages 3761-3766

Microstructure and growth mechanism of stressed complex oxide thin films in strain-modulation

(6) Li, J L a Rong Li, Y a Zhu, J a Zhang, Y a Yang, F b Fei, W b

a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA (China)

b HARBIN INSTITUTE OF TECHNOLOGY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPRESSIVE STRESS; HETEROJUNCTIONS; MICROSTRUCTURE; MOLECULAR BEAM EPITAXY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; STRAIN; SUBSTRATES;

COMPRESSIVE STRESS-INDUCED NANOSTRUCTURE; LASER MOLECULAR BEAM EPITAXY (L-MBE); NANOSTRUCTURES; STRAIN MODULATIONS;

THIN FILMS;

EID: 33746071234 PISSN: 00222461 EISSN: 15734803 Source Type: Journal
DOI: 10.1007/s10853-005-5602-8 Document Type: Article

Times cited : (6)

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