Control of growth mode in SrTiO3 homoepitaxy under 500°C

Journal of Applied Physics

Volumn 96, Issue 3, 2004, Pages 1640-1643

  Li, Yan Rong ^a   Li, Jin Long ^a   Zhang, Ying ^a   Wei, Xian Hua ^a   Deng, Xin Wu ^a   Liu, Xing Zhao ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CMOS INTEGRATED CIRCUITS; EXCIMER LASERS; FIELD EFFECT TRANSISTORS; FILM GROWTH; IMAGE PROCESSING; MOLECULAR BEAM EPITAXY; OPTIMIZATION; PERMITTIVITY; PEROVSKITE; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SILICA; STRONTIUM COMPOUNDS;

ADIABATIC EXPANSION; CRYSTAL FILMS; LASER ENERGY DENSITY; STRANSKI-KRASTANOV GROWTH MODE (S.K. GROWTH);

THIN FILMS;

EID: 4043058061     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1763987     Document Type: Article

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