Improvement of isolation for MEMS capacitive switch via membrane planarization

Sensors and Actuators, A: Physical

Volumn 119, Issue 1, 2005, Pages 206-213

  Yu, A B ^a   Liu, A Q ^a   Zhang, Q X ^b   Alphones, Arokiaswami ^a   Zhu, Lei ^a   Shacklock, Andrew Peter ^c  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b INSTITUTE OF MICROELECTRONICS   (Singapore)

^c SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

Capacitance switch; Coplanar waveguide (CPW); RF MEMS

Indexed keywords

CAPACITANCE; CHEMICAL MECHANICAL POLISHING; DIELECTRIC MATERIALS; ELECTRIC SWITCHES; MATHEMATICAL MODELS; MEMBRANES; MICROWAVE ISOLATORS; PHOTORESISTS; STRONTIUM COMPOUNDS; SURFACE ROUGHNESS; WAVEGUIDES;

CAPACITANCE SWITCHES; ISOLATION; MEMBRANE PLANARIZATION; RADIO FREQUENCY MICROELECTROMECHANICAL SYSTEMS (RF MEMS);

MICROELECTROMECHANICAL DEVICES;

EID: 17144426984     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2004.09.010     Document Type: Article

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