Visible-light inspection of EUVL multilayer mask blanks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5446, Issue PART 2, 2004, Pages 860-869

  Hashimoto, Takeo ^a   Yamanashi, Hiromasa ^a   Miyagaki, Shinji ^a   Nishiyama, Iwao ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

Defect; EUVL mask; Multilayer mask blank; PSL; Visible light inspection

Indexed keywords

LATEXES; LIGHT SCATTERING; OPTICAL MULTILAYERS; PHOTOLITHOGRAPHY; SUBSTRATES; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) MASK; MULTILAYER MASK BLANK; POLYSTYRENE LATEX (PSL); VISIBLE-LIGHT INSPECTION;

MASKS;

EID: 11844302921     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557772     Document Type: Conference Paper

References (4)

1. T. Hashimoto, H. Yamanashi, M. Sugawara, and I. Nishiyama, "Lithographic Characterization of EUVL Mask Blank Defects", Proc. SPIE Vol. 5374 to be published (2004).
2. M. Yi, T. Haga, C. Walton, C. Larson, and J. Bokor, "Actinic-only defects in extreme ultraviolet lithography mask blanks - Negative defects at the detection limit of visible-light inspection tools", Jpn. J. Appl. Phys. Vol. 41, 4101-4104 (2002).
3. J.-P. Urbach, J. F. W. Cavelaars, H. Kusunose, T. Liang, and A. R. Stivers, "EUV substrate and blank inspection with confocal microscopy", Proc. SPIE Vol. 5256, 556-565 (2003).
4. S. P. Hau-Reigu, A. Barty, P. B. Mirkarimi, D. G. Steams, H. Chapman, D. Sweeney, M. Clift, E. Gullikson, and M-S. Yi, "Defect repair for extreme ultraviolet lithography (EUVL) mask blanks", Proc. SPIE Vol. 5037, 331-338 (2003).