Optical inspection of NGL masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 2, 2004, Pages 807-815

  Pettibone, Donald W ^a   Stokowski, Stan ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEFECTS; INSPECTION; LITHOGRAPHY; MULTILAYERS; OPTIMIZATION; SILICON WAFERS; ULTRAVIOLET RADIATION;

ELECTRON PROJECTION LITHOGRAPHY (EPL); INSPECTION TOOLS; NEXT GENERATION LITHOGRAPHY (NGL); RETICLE INSPECTION;

MASKS;

EID: 19844369723     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569366     Document Type: Conference Paper

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