Tip-induced large-area oxide bumps and composition stoichiometry test via atomic force microscopy

Surface Science

Volumn 601, Issue 18, 2007, Pages 3788-3791

  Lu, Yo Shan ^a   Wu, Hsin I ^a   Wu, Sheng Yun ^a   Ma, Yuan Ron ^a  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

Author keywords

Atomic force microscopy (AFM); Backscattered electron image; Energy dispersive X ray spectrometer (EDS); Oxidation; Silicon oxides; Stoichiometric composition

Indexed keywords

ATOMIC FORCE MICROSCOPY; BACKSCATTERING; ELECTRONS; ENERGY DISPERSIVE SPECTROSCOPY; OXYGEN; STOICHIOMETRY;

BACKSCATTERED ELECTRON IMAGE; ENERGY DISPERSIVE; LARGE-AREA OXIDE BUMPS; SILICON OXIDES; STOICHIOMETRIC COMPOSITION;

OXIDES;

EID: 34548604883     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.04.007     Document Type: Article

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