Target noise in overlay metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 403-412

  Seligson, Joel ^a   Adel, Mike ^a   Izikson, Pavel ^a   Levinski, Vladimir ^a   Yaffe, Dan ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

QUANTITATIVE DIAGNOSTIC METHOD; SCANNER EFFECTS; SPATIAL NOISE;

ATOMIC FORCE MICROSCOPY; COMPUTER AIDED DESIGN; FOURIER TRANSFORMS; HIERARCHICAL SYSTEMS; LITHOGRAPHY; MATHEMATICAL MODELS;

SPURIOUS SIGNAL NOISE;

EID: 4344673159     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534515     Document Type: Conference Paper

References (2)

1. Adel, M., Ghinovker, M., Poplawski, J., Kassel, E., Izikson, P., Pollentier, I., Leray, P., Laidler, D., "Characterization of overlay mark fidelity," in Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, Editor, Proceedings of SPIE Vol. 5038, pp. 437-444 (2003).
2. Schwartz, M., Information, Transmission, Modulation and Noise, p. 459, McGrawHill, 1990.