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Volumn 5752, Issue III, 2005, Pages 1441-1449
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Application of through-focus focus-metric analysis in high resolution optical metrology
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Author keywords
CD metrology; Focus metric signature; High resolution optics; Optical aberrations; Optical characterization; Process control; Through focus analysis
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Indexed keywords
CD METROLOGY;
FOCUS METRIC SIGNATURE;
HIGH RESOLUTION OPTICS;
OPTICAL CHARACTERIZATION;
THROUGH FOCUS ANALYSIS;
ABERRATIONS;
DIFFRACTION GRATINGS;
IMAGE ANALYSIS;
INFORMATION ANALYSIS;
MEASUREMENTS;
METRIC SYSTEM;
OPTICAL SYSTEMS;
PROCESS CONTROL;
OPTICAL VARIABLES MEASUREMENT;
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EID: 24644476489
PISSN: 16057422
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.621106 Document Type: Conference Paper |
Times cited : (27)
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References (8)
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