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Volumn 5752, Issue III, 2005, Pages 1441-1449

Application of through-focus focus-metric analysis in high resolution optical metrology

Author keywords

CD metrology; Focus metric signature; High resolution optics; Optical aberrations; Optical characterization; Process control; Through focus analysis

Indexed keywords

CD METROLOGY; FOCUS METRIC SIGNATURE; HIGH RESOLUTION OPTICS; OPTICAL CHARACTERIZATION; THROUGH FOCUS ANALYSIS;

EID: 24644476489     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.621106     Document Type: Conference Paper
Times cited : (27)

References (8)
  • 2
    • 0032677809 scopus 로고    scopus 로고
    • Focus and edge detection algorithms and their relevance to the development of an optical overlay calibration standard
    • S. Fox, R.M. Silver, E. Kornegay and M. Dagenais, "Focus and edge detection algorithms and their relevance to the development of an optical overlay calibration standard," Proc. SPIE, 3677, p. 95 (1999).
    • (1999) Proc. SPIE , vol.3677 , pp. 95
    • Fox, S.1    Silver, R.M.2    Kornegay, E.3    Dagenais, M.4
  • 5
    • 0000741812 scopus 로고
    • Facts relating to optical science no. IV
    • H. F. Talbot, "Facts relating to optical science no. IV", Phil. Mag. 9, (1836).
    • (1836) Phil. Mag. , vol.9
    • Talbot, H.F.1
  • 6
    • 0005094554 scopus 로고
    • Analytic waveguide solutions and the coherence probe microscope
    • Leuven, Belgium, September
    • M. Davidson, "Analytic waveguide solutions and the coherence probe microscope," Proceedings of Microcircuit Engineering 90, Leuven, Belgium, September 1990.
    • (1990) Proceedings of Microcircuit Engineering , vol.90
    • Davidson, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.