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Volumn 6152 I, Issue , 2006, Pages

The limits of image-based optical metrology

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE-BASED OPTICAL METROLOGY; OPTICAL TECHNIQUES; RAYLEIGH RESOLUTION; SCATTERFIELD MICROSCOPY;

EID: 33745635704     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.660289     Document Type: Conference Paper
Times cited : (19)

References (11)
  • 3
    • 4344698738 scopus 로고    scopus 로고
    • Simultaneous critical dimension and overlay measurements on a SEM through target design for inline manufacturing lithography control
    • E. Solecky and J. Morillo, "Simultaneous Critical Dimension and Overlay Measurements on a SEM Through Target Design for Inline Manufacturing Lithography Control", SPIE Proc. Vol. 5375, p. 41, 2004.
    • (2004) SPIE Proc. , vol.5375 , pp. 41
    • Solecky, E.1    Morillo, J.2
  • 7
    • 0036028585 scopus 로고    scopus 로고
    • Comparison of measured optical image profiles of silicon lines with two different theoretical models
    • R. M. Silver, R. Attota, M. Stocker, J. Jun, E. Marx, R. Larrabee, B. Russo, and M. Davaidson, "Comparison of Measured Optical Image Profiles of Silicon Lines with Two Different Theoretical Models", SPIE Vol. 4689, 2002
    • (2002) SPIE , vol.4689
    • Silver, R.M.1    Attota, R.2    Stocker, M.3    Jun, J.4    Marx, E.5    Larrabee, R.6    Russo, B.7    Davaidson, M.8
  • 11
    • 0031382539 scopus 로고    scopus 로고
    • A comparison between rigorous light scattering methods
    • Optical Microlithography X
    • M. Davidson, B.H. Kleemann, and J. Bischoff, "A comparison between rigorous light scattering methods," in Optical Microlithography X, SPIE, Vol. 305, 1997, p.606.
    • (1997) SPIE , vol.305 , pp. 606
    • Davidson, M.1    Kleemann, B.H.2    Bischoff, J.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.