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1
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4344588061
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Evaluation of new in-chip and arrayed line overlay target designs
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Feb.
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R. Attota, R. M. Silver, M. Bishop, E. Marx, J. Jun, M. Stocker. Davidson, and R. Larrabee, "Evaluation of new in-chip and arrayed line overlay target designs", Proc. SPIE Microlithography, Feb. 2004.
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(2004)
Proc. SPIE Microlithography
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Attota, R.1
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Bishop, M.3
Marx, E.4
Jun, J.5
Davidson, M.S.6
Larrabee, R.7
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2
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4344673159
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Target noise in overlay metrology
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J. Seligson, M. Adel, P. Izikson, V. Levinski, and D. Yaffe, "Target Noise in Overlay Metrology", SPIE Vol. 5375, p. 403-412 (2004)
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SPIE
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Seligson, J.1
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3
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4344698738
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Simultaneous critical dimension and overlay measurements on a SEM through target design for inline manufacturing lithography control
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E. Solecky and J. Morillo, "Simultaneous Critical Dimension and Overlay Measurements on a SEM Through Target Design for Inline Manufacturing Lithography Control", SPIE Proc. Vol. 5375, p. 41, 2004.
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Solecky, E.1
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4
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24644457630
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High-resolution optical metrology
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R. M. Silver, R. Attota, M. Stocker, M. Bishop, L. Howard, T. Germer, E. Marx, M. Davidson, and R. Larrabee, "High-resolution Optical Metrology", Proc. SPIE Vol. 5752 p. 67, (2005).
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(2005)
Proc. SPIE
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Silver, R.M.1
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Marx, E.7
Davidson, M.8
Larrabee, R.9
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5
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4344698737
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High-resolution optical overlay metrology
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R. M. Silver, R. Attota, M. Stocker, M. Bishop, J. Jun, E. Marx, M. Davidson, and R. Larrabee, "High-resolution Optical Overlay Metrology", SPIE Vol. 5375 P. 78, 2004
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SPIE
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Silver, R.M.1
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Marx, E.6
Davidson, M.7
Larrabee, R.8
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6
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24644476489
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Application of through-focus focus-metric analysis in high resolution optical microscopy
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R. Attota, R. M. Silver, T. Germer, M. Bishop, R. Larrabee, M. Stocker, and L. Howard, "Application of Through-focus Focus-metric Analysis in High Resolution Optical Microscopy", Proc. SPIE Vol. 5752 (2005).
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7
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0036028585
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Comparison of measured optical image profiles of silicon lines with two different theoretical models
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R. M. Silver, R. Attota, M. Stocker, J. Jun, E. Marx, R. Larrabee, B. Russo, and M. Davaidson, "Comparison of Measured Optical Image Profiles of Silicon Lines with Two Different Theoretical Models", SPIE Vol. 4689, 2002
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SPIE
, vol.4689
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Silver, R.M.1
Attota, R.2
Stocker, M.3
Jun, J.4
Marx, E.5
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Russo, B.7
Davaidson, M.8
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8
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33745617279
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Tech Transfer #03074417A-ENG, International SEMATECH
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M. Bishop, R. Silver, and B. Bunday, "The OMAG 3 Reticle Set", Tech Transfer #03074417A-ENG, International SEMATECH, 2004.
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(2004)
The OMAG 3 Reticle Set
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Bishop, M.1
Silver, R.2
Bunday, B.3
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10
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0003571289
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ISBN: 0-534-19869-4, Duxbury Press
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Regression Analysis, Concepts and Applications, Franklin A. Graybill, Hariharan K. Iyer, ISBN: 0-534-19869-4, Duxbury Press, 1994.
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(1994)
Regression Analysis, Concepts and Applications
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Graybill, F.A.1
Iyer, H.K.2
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11
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0031382539
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A comparison between rigorous light scattering methods
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Optical Microlithography X
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M. Davidson, B.H. Kleemann, and J. Bischoff, "A comparison between rigorous light scattering methods," in Optical Microlithography X, SPIE, Vol. 305, 1997, p.606.
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Davidson, M.1
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