High-resolution optical overlay metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 78-95

  Silver, R M ^a   Attota, R ^a   Stocker, M ^a   Bishop, M ^b   Jun, J ^a   Marx, E ^a   Davidson, M ^c   Larrabee, R ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

^c Spectel Co   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL DIMENSION; OPTICAL PROXIMITY; OVERLAY METROLOGY; PHOTOMASK METROLOGY;

ALGORITHMS; ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; FOURIER OPTICS; IMAGE ANALYSIS; IMAGING TECHNIQUES; MASKS; MATHEMATICAL MODELS; OPTICAL RESOLVING POWER; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; SENSITIVITY ANALYSIS;

MEASUREMENT THEORY;

EID: 4344698737     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.539028     Document Type: Conference Paper

References (15)

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