Simulation of optical microscope images for photomask feature size measurements

IEEE Antennas and Propagation Society, AP-S International Symposium (Digest)

Volumn 3 B, Issue , 2005, Pages 243-246

  Marx, Egon ^a   Potzick, James ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33846917296     PISSN: 15223965     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/APS.2005.1552483     Document Type: Conference Paper

References (7)

1. M. Davidson, "Developments in optical modeling methods for metrology," in Metrology, Inspection, and Process Control XIII, Proceedings of the SPIE, Vol. 3677, 866-875, 1999.
2. A. J. Poggio and E. K. Miller, "Integral equation solutions of three-dimensional problems," in Computer Techniques for Electromagnetics, R. Mittra, Ed. Oxford: Pergamon, 1973.
3. E. Marx, "Integral equation for scattering by a dielectric," IEEE Trans. Antennas Propagat., vol. 32, pp. 166-172, 1984.
4. E. Marx, "Scattering by an Arbitrary Cylinder at a Plane Interface: Broadside Incidence," IEEE Trans. Antennas Propagat. 37, 619-628 (1989);
5. "Scattering by an Arbitrary Cylinder at a Plane Interface," in Radar Cross Sections of Complex Objects, W. R. Stone, Ed., IEEE Press, pp. 356-370 (1990).
6. E. Marx, "Images of Strips On and Trenches In Substrates," preprint.
7. J. Potzick, J. M. Pedulla, and M. Stocker, "Updated NIST photomask linewidth standard," in Metrology, Inspection, and Process Control for Microlithography XVII, Proceedings of the SPIE, Vol. 5038, 338-349 (2003).