Comparison of measured optical image profiles of silicon lines with two different theoretical models

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 409-429

  Silver, R ^a   Attota, R ^a   Stocker, M ^a   Jun, J ^a   Marx, E ^a   Larrabee, R ^a   Russo, B ^a   Davidson, M ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTER SIMULATION; ERROR ANALYSIS; GEOMETRY; SCANNING ELECTRON MICROSCOPY;

OPTICAL INTENSITY PROFILES;

LITHOGRAPHY;

EID: 0036028585     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.473479     Document Type: Conference Paper

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