Low pressure MOCVD of Er2O3 and Gd2O3 films

Materials Chemistry and Physics

Volumn 105, Issue 2-3, 2007, Pages 433-441

  Singh, M P ^a   Shripathi, T ^b   Shalini, K ^a   Shivashankar, S A ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

^b Inter University Consortium   (India)

Author keywords

Electrical properties; Microstructure; MOCVD; Optical; Rare earth oxides

Indexed keywords

ELECTRIC PROPERTIES; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; OPTICAL PROPERTIES; OXIDES; POLYCRYSTALLINE MATERIALS; RARE EARTH COMPOUNDS;

CRYSTALLINITY; GROWTH CONDITIONS;

THIN FILMS;

EID: 34548436904     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2007.05.009     Document Type: Article

References (25)

1. Wong H.S.P. IBM J. Res. Dev. 46 (2002) 133
2. Xue D., Betzler K., and Hesse H. J. Phys.: Condens. Matter 12 (2000) 3113
3. Mikhelashvili V., Eisentsein G., and Edelmann F. J. Appl. Phys. 90 (2001) 5447
4. Mikhelashvili V., Eisenstein G., and Edelmann F. Appl. Phys. Lett. 80 (2002) 2156
5. Hong M., Kwo J., Kortan A.R., Mannaerts J.P., and Sergent A.M. Science 283 (1999) 1897
6. Kwo J., Hong M., Kortan A.R., Queeney K.T., Chabal Y.J., Opila Jr. R.L., Muller D.A., Chu S.N.G., Sapjeta B.J., Lay T.S., Mannaerts J.P., Boone T., Krautter H.W., Krajewski J.J., Sergent A.M., and Rosamilia J.M. J. Appl. Phys. 89 (2001) 3920
7. Osten H.J., Liu J.P., and Mussing H.J. Appl. Phys. Lett. 80 (2002) 297
8. Ono H., and Katsumata T. Appl. Phys. Lett. 78 (2001) 1832
9. Saxena U., and Srivastava O.N. Thin Solid Films 33 (1975) 185
10. Wiktorczyk T. Appl. Opt. 31 (2001) 5
11. Fissel A., Osten H.J., and Bugiel E. J. Vac. Sci. Technol. B 21 (2003) 1765
12. Gottlob H.D.B., Lemme M.C., Mollenhauer T., Wahlbrink T., Efavi J.K., Kurz H., Stefanov Y., Haberle K., Komaragiri R., Ruland T., Zaunert F., and Schwalke U. J. Non-Cryst. Solids 351 (2005) 1885
13. Hitchman M.L., and Jensen K.F. Chemical Vapour Deposition: Principle and Application (1993), Academic Press Inc., New York
14. Singh M.P., Shivashankar S.A., and Shripathi T. Int. J. Mod. Phys. B 16 (2002) 1261
15. Nigro R.L., Raineri V., Bongiorno C., Toro R., Malandrino G., and Fragalá I.L. Appl. Phys. Lett. 83 (2003) 129
16. Hubbard K.M., and Espinoza B.F. Thin Solid Films 366 (2000) 175
17. Loo Y.F., Potter R.J., Jones A.C., Aspinall H.C., Gaskell J.M., Chalker P.R., Smith L.M., and Critchlow G.W. Chem. Vapour Deposition 10 (2004) 306
18. Singh M.P., Thakur C.S., Shalini K., Bhat N., and Shivashankar S.A. Appl. Phys. Lett. 83 (2003) 2889
19. Singh M.P., Thakur C.S., Shalini K., Banerjee S., Bhat N., and Shivashankar S.A. J. Appl. Phys. 96 (2004) 5631
20. Boulesteix C. In: Gschneidner Jr. K.A., and Eyring L. (Eds). Handbook on the Physics and Chemistry of Rare Earths (1982), North Holland (Chapter 44)
21. Back D.M. In: Francombe M.F., and Vossen J.L. (Eds). Physics of Thin Films: Advances in Research and Development vol. 15 (1991), Academic Press Inc., New York 265-312
22. Uwamino Y., and Ishizuka T. J. Electron Spectroc. Relat. Phenom. 34 (1984) 67
23. Briggs D., and Seah M.P. Practical Surface Analysis (1982), John Wiley and Sons Ltd., New York
24. Nicollian E.H., and Brews J.R. Metal Oxide Semiconductor (MOS) Physics and Technology (1982), John Wiley & Sons, New York
25. Sze S.M. Physics of Semiconductor Devices (1999), John Wiley & Sons Inc., New York