Three-dimensional deposition topography simulation based on new combinations of flux distribution and surface representation algorithms

Thin Solid Films

Volumn 445, Issue 1, 2003, Pages 80-89

  Kwon, Ui Hui ^a   Lee, Won Jong ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Chemical vapor deposition; Computer simulation; Deposition process; Physical vapor deposition

Indexed keywords

ALGORITHMS; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; MONTE CARLO METHODS; PHYSICAL VAPOR DEPOSITION;

DEPOSITION PROCESS;

THIN FILMS;

EID: 0242366725     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01286-0     Document Type: Article

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