Subnanometer surface roughness of dc magnetron sputtered Al films

Journal of Applied Physics

Volumn 102, Issue 2, 2007, Pages

  Rode, D L ^a   Gaddam, V R ^a   Yi, Ji Haeng ^a  

^a WASHINGTON UNIVERSITY IN ST LOUIS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; SURFACE ROUGHNESS; THERMAL EFFECTS;

ARGON SPUTTERING PRESSURE; HIGH-INTENSITY NORMALLY INCIDENT WHITE-LIGHT ILLUMINATION;

METALLIC FILMS;

EID: 34547575967     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2756039     Document Type: Article

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