Aluminum metallization for flat-panel displays using ion-beam-assisted physical vapor deposition

Journal of Materials Research

Volumn 14, Issue 10, 1999, Pages 4051-4061

  Ma, Zhenqiang ^a   Was, Gary S ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTIVITY OF SOLIDS; FLAT PANEL DISPLAYS; ION BOMBARDMENT; METALLIC FILMS; METALLIZING; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTIES; TEXTURES; VAPOR DEPOSITION; X RAY DIFFRACTION ANALYSIS;

HILLOCKS; OUT-OF-PLANE TEXTURE;

ALUMINUM;

EID: 0033276941     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0547     Document Type: Article

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