Dependence of plasma characteristics on dc magnetron sputter parameters

Journal of Applied Physics

Volumn 98, Issue 8, 2005, Pages

  Wu, S Z ^a  

^a SEAGATE TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON TEMPERATURE; ION DENSITY; PLASMA CHARACTERISTICS; PLASMA DISCHARGE;

CARRIER CONCENTRATION; CORRELATION THEORY; ELECTRIC POTENTIAL; PARAMETER ESTIMATION; PLASMA APPLICATIONS; PLASMA DENSITY;

MAGNETRON SPUTTERING;

EID: 27744503547     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2112177     Document Type: Article

References (19)

1. A. E. Wendt, M. A. Lieberman, and H. Meuth, J. Vac. Sci. Technol. A 6, 1827 (1988).
2. T. E. Sheridan, M. J. Goeckner, and J. Goree, J. Vac. Sci. Technol. A 8, 30 (1990).
3. S. L. Rohde, I. Petrov, W. D. Sproul, S. A. Barnett, P. J. Rudnik, and M. E. Graham, Thin Solid Films 193/194, 117 (1990).
4. R. P. Howson, H. A. J'afer, and A. G. Spencer, Thin Solid Films 193/194, 127 (1990).
5. S. M. Rossnagel and H. R. Kaufmann, J. Vac. Sci. Technol. A 4, 1822 (1986).
6. T. E. Sheridan, M. J. Goeckner, and J. Goree, J. Vac. Sci. Technol. A 9, 688 (1991).
7. T. E. Sheridan, M. J. Goeckner, and J. Goree, J. Vac. Sci. Technol. A 16, 2173 (1998).
8. D. J. Field, S. K. Dew, and R. E. Burrell, J. Vac. Sci. Technol. A 20, 2032 (2002).
9. M. J. Goeckner, J. Goree, and T. E. Sheridan, J. Vac. Sci. Technol. A 8, 3920 (1990).
10. Y. W. Choi, M. Bowden, and K. Muraoka, Jpn. J. Appl. Phys., Part 1 35, 5858 (1996).
11. L. Gu and M. A. Lieberman, J. Vac. Sci. Technol. A 6, 2960 (1988).
12. S. Miyake, N. Shimura, T. Makabe, and A. Itoh, J. Vac. Sci. Technol. A 10, 1135 (1992).
13. J. E. Miranda, M. J. Goeckner, J. Goree, and T. E. Sheridan, J. Vac. Sci. Technol. A 8, 1627 (1990).
14. E. Shidoji, N. Nakano, and T. Makabe, Thin Solid Films 351, 37 (1999).
15. I. G. Kouznetsov, A. J. Lichtenberg, and M. A. Lieberman, J. Appl. Phys. 86, 4142 (1999).
16. R. M. Clements, J. Vac. Sci. Technol. 15, 193 (1978).
17. M. B. Hopkins and W. G. Graham, Rev. Sci. Instrum. 57, 2210 (1986).
18. T. P. Drusedau, M. Lohmann, and B. Garke, J. Vac. Sci. Technol. A 16 (4), 2728 (1998).
19. J. V. Scanlan and M. B. Hopkins, J. Vac. Sci. Technol. A 10, 1207 (1992).