Sheet resistance and crystallinity of Ga- and Al-implanted zinc oxide thin films with postannealing

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 4, 2007, Pages 706-710

  Matsuda, Tokiyoshi ^a   Furuta, Mamoru ^b   Hiramatsu, Takahiro ^b,c   Furuta, Hiroshi ^d   Hirao, Takashi ^d  

^a KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b Kochi Industrial Promotion Center   (Japan)

^c CASIO   (Japan)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; ION IMPLANTATION; OXIDE FILMS; SEMICONDUCTING GALLIUM; SHEET RESISTANCE; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

CRYSTALLINITY; POSTANNEALING; UNIMPLANTED ZNO THIN FILMS;

THIN FILMS;

EID: 34547362947     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2735958     Document Type: Article

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