Laser induced backside dry etching of transparent materials

Applied Surface Science

Volumn 253, Issue 19, 2007, Pages 7922-7925

  Hopp, B ^a   Vass, Cs ^a   Smausz, T ^a  

^a UNIVERSITY OF SZEGED   (Hungary)

Author keywords

KrF; LIBWE; Quartz

Indexed keywords

DRY ETCHING; EXCIMER LASERS; FUSED SILICA; MICROMACHINING; THIN FILMS; TRANSPARENCY;

LASER INDUCED BACKSIDE WET ETCHING (LIBWE); NANOSECOND KRF EXCIMER LASERS; SOLID THIN FILMS; TRANSPARENT MATERIALS;

WET ETCHING;

EID: 34447340650     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.02.068     Document Type: Article

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