Atomic force microscope nanolithography of polymethylmethacrylate polymer

Review of Scientific Instruments

Volumn 78, Issue 5, 2007, Pages

  Teixeira, F S ^a   Mansano, R D ^a   Salvadori, M C ^a   Cattani, M ^a   Brown, I G ^b  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON BEAMS; NANOLITHOGRAPHY; TOPOGRAPHY;

ELECTRON BEAM IRRADIATION; SCANNING CONTACT ATOMIC FORCE MICROSCOPY; SILICON TIPS;

POLYMETHYL METHACRYLATES;

ELECTRON BEAMS; LITHOGRAPHY; MICROSCOPY; POLYMETHYL METHACRYLATE; TOPOGRAPHY;

NANOMATERIAL; POLY(METHYL METHACRYLATE);

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; EVALUATION; MATERIALS TESTING; METHODOLOGY; NANOTECHNOLOGY; SURFACE PROPERTY; ULTRASTRUCTURE;

MATERIALS TESTING; MICROSCOPY, ATOMIC FORCE; NANOSTRUCTURES; NANOTECHNOLOGY; POLYMETHYL METHACRYLATE; SURFACE PROPERTIES;

EID: 34249941735     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2736311     Document Type: Article

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