Novel approach to atomic force lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 1983-1986

  Hu, S ^a   Altmeyer, S ^a   Hamidi, A ^a   Spangenberg, B ^a   Kurz, H ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003648425     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590117     Document Type: Article

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