Formation and removal of composite halogenated silicon oxide and fluorocarbon films deposited on chamber walls during plasma etching of multiple film stacks

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 5, 2002, Pages 1939-1946

  Ullal, Saurabh J ^a   Singh, Harmeet ^b   Daugherty, John ^b   Vahedi, Vahid ^b   Aydil, Eray S ^a  

^a University of California   (United States)

^b LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; COMPUTER SIMULATION; DISSOCIATION; FLUOROCARBONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED RADIATION; MONOCHROMATORS; ORGANIC COATINGS; PLASMA ETCHING; SILICON COMPOUNDS; SILICON WAFERS;

GAS DISCHARGES; HALOGENATED SILICON OXIDE; OPTICAL EMISSION SPECTRA; PLASMA DIAGNOSTIC TECHNIQUES;

THIN FILMS;

EID: 0036026360     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1502698     Document Type: Article

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