Fabrication of subwavelength metallic structures by using a metal direct imprinting process

Journal of Physics D: Applied Physics

Volumn 40, Issue 11, 2007, Pages 3440-3447

  Hsieh, C W ^a   Hsiung, H Y ^a   Lu, Y T ^a   Sung, C K ^a   Wang, W H ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON BEAM LITHOGRAPHY; METALLIC FILMS; WAVELENGTH;

METAL DIRECT IMPRINTING; METALLIC STRUCTURES; SUBWAVELENGTH STRUCTURES;

THIN FILMS;

LITHOGRAPHY; METALS; PRINTING; THIN FILMS;

EID: 34249308526     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/11/027     Document Type: Article

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