A scheme to control laser power and exposure time for fabricating precise 3-dimensional microstructures using two-photon polymerization

Journal of the Korean Chemical Society

Volumn 49, Issue 3, 2005, Pages 292-299

  Park, Sang Hu ^a   Lim, Tae Woo ^a   Yang, Dong Yol ^a   Kong, Hong Jin ^a   Lee, Kwang Sup ^b  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Hannam University   (South Korea)

Author keywords

3 D microstructures; Nano stereolithography; Two photon polymerization; Voxel

Indexed keywords

ASPECT RATIO; DIFFRACTION; ELECTROMAGNETIC PULSE; LUMINESCENCE OF ORGANIC SOLIDS; MICROSTRUCTURE; PHOTOCHEMICAL REACTIONS; PHOTONS; PHOTOPOLYMERIZATION; POLYMERIZATION; TWO PHOTON PROCESSES;

3D MICROSTRUCTURES; DIFFRACTION LIMITS; FEMTOSECOND PULSE LASER; NORMAL DIRECTION; THREE-DIMENSIONAL (3D) MICROSTRUCTURES; TWO PHOTON ABSORPTION; TWO PHOTON POLYMERIZATION; VOXEL;

POWER CONTROL;

EID: 34249107813     PISSN: 10172548     EISSN: 22348530     Source Type: Journal    
DOI: 10.5012/jkcs.2005.49.3.292     Document Type: Article

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