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Journal of Photopolymer Science and Technology

Volumn 17, Issue 3, 2004, Pages 385-392

Recent progress of lithographic microfabrication by the TPA-induced photopolymerization

(11) Yang, Hyun Kwan a Kim, Moon Soo a Kang, Seung Wan a Kim, Kyoung Soo a Lee, Kwang Sup b Park, Sang Hu b Yang, Dong Yol b Kong, Hong Jin b Sun, Hong Bo c Kawata, Satoshi c Fleitz, Paul d

a Hannam University (South Korea)

b Korea Advanced Institute of Science and Technology (KAIST) (South Korea)

c OSAKA UNIVERSITY (Japan)

d AIR FORCE RESEARCH LABORATORY (United States)

Author keywords

3D microfabrication; Two photon absorption; Two photon initiated photopolymerization

Indexed keywords

DIMETICONE; RESIN;

CHEMICAL STRUCTURE; CHROMATOPHORE; CROSS LINKING; CRYSTAL; LIGHT ABSORPTION; LITHOGRAPHY; MICROFABRICATION; PHOTOCHEMISTRY; PHOTOPOLYMERIZATION; POLYMERIZATION; PRESSURE; PROCESS TECHNOLOGY; REPRODUCIBILITY; REVIEW; SCANNING ELECTRON MICROSCOPY; SYNTHESIS; VACUUM;

EID: 3142512453 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.17.385 Document Type: Review

Times cited : (22)

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