Chemical and nanomechanical characteristics of fluorocarbon thin films deposited by using plasma enhanced chemical vapor deposition

Journal of the Korean Physical Society

Volumn 50, Issue 4, 2007, Pages 1113-1118

  Kim, Nam Kyun ^a   Cha, Nam Goo ^a   Kim, Kyu Chae ^a   Kim, Tae Gon ^a   Park, Jin Goo ^a  

^a Hanyang University   (South Korea)

Author keywords

Adhesion force; Antistiction layer; Fluorocarbon film; MEMS

Indexed keywords

EID: 34248400782     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.50.1113     Document Type: Article

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