Oxide-nitride-oxide dielectric stacks with Si nanoparticles obtained by low-energy ion beam synthesis

Nanotechnology

Volumn 18, Issue 21, 2007, Pages

  Ioannou Sougleridis, V ^a   Dimitrakis, P ^a   Vamvakas, V Em ^a   Normand, P ^a   Bonafos, C ^b   Schamm, S ^b   Mouti, A ^b   Ben Assayag, G ^b   Paillard, V ^c  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b CEMES CNRS   (France)

^c UNIVERSITÉ PAUL SABATIER   (France)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC STACKS; ELECTRICAL CHARACTERIZATION; ION BEAM SYNTHESIS; SILICON NANOPARTICLES;

CHARGE TRANSFER DEVICES; ION IMPLANTATION; NANOPARTICLES; SILICON NITRIDE;

DIELECTRIC MATERIALS;

NANOPARTICLE; NITROGEN; OXIDE; SILICON;

ARTICLE; DIELECTRIC CONSTANT; FILM; LOW ENERGY RADIATION; NANOTECHNOLOGY; PRIORITY JOURNAL; PROTON TRANSPORT; SEMICONDUCTOR; SURFACE CHARGE;

EID: 34247853203     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/21/215204     Document Type: Article

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