Electrical properties of Si nanocrystals embedded in an ultrathin oxide

Nanotechnology

Volumn 10, Issue 2, 1999, Pages 127-131

  Maeda, Tatsuro ^a   Suzuki, Eiichi ^a   Sakata, Isao ^a   Yamanaka, Mitsuyuki ^a   Ishii, Kenichi ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; NANOSTRUCTURED MATERIALS; SEMICONDUCTOR DIODES; THERMOOXIDATION; TRANSMISSION ELECTRON MICROSCOPY;

RAPID THERMAL OXIDATION (RTO); ULTRATHIN OXIDES;

SEMICONDUCTING SILICON;

EID: 0032676703     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/10/2/304     Document Type: Article

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