UV assisted oxidation and nitridation of hafnia based thin films for alternate gate dielectric applications

Applied Surface Science

Volumn 253, Issue 15, 2007, Pages 6493-6498

  Ramani, K ^a   Essary, C R ^a   Craciun, V ^a   Singh, R K ^a  

^a J Crayton Pruitt Family Department of Biomedical Engineering   (United States)

Author keywords

Hafnia; Hf single bond Si single bond O single bond N; UV assisted oxidation

Indexed keywords

GATE DIELECTRICS; HAFNIUM COMPOUNDS; LASER ABLATION; LEAKAGE CURRENTS; NITRIDATION; OXIDATION;

HAFNIA; HF-SI-O-N; INTERFACIAL LAYERS; UV ASSISTED OXIDATION;

THIN FILMS;

EID: 34247569916     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.01.027     Document Type: Article

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