Low-temperature growth of high-k thin films by ultraviolet-assisted pulsed laser deposition

Applied Surface Science

Volumn 168, Issue 1-4, 2000, Pages 123-126

  Craciun, V ^a   Howard, J M ^a   Bassim, N D ^a   Singh, R K ^a  

^a University of Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT DENSITY; DEPOSITION; DIELECTRIC FILMS; INTERFACES (MATERIALS); LASER ABLATION; PERMITTIVITY; PHOTOCHEMICAL REACTIONS; PULSED LASER APPLICATIONS; THIN FILMS; ULTRAVIOLET RADIATION;

PHYSISORBED OXYGEN; PULSED LASER DEPOSITION;

FILM GROWTH;

EID: 0034508067     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00615-2     Document Type: Article

References (9)

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