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Volumn 303, Issue 2, 2007, Pages 419-426

Selective epitaxial growth of AlN and GaN nanostructures on Si(1 1 1) by using NH3 as nitrogen source

Author keywords

A1. Nanostructures; A1. Reflection high energy electron diffraction; A1. Surface structure; A3. Molecular beam epitaxy; B1. Nitrides

Indexed keywords

MOLECULAR BEAM EPITAXY; NANOSTRUCTURES; NITRIDES; SCANNING TUNNELING MICROSCOPY; SURFACE STRUCTURE;

EID: 34247349978     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.01.007     Document Type: Article
Times cited : (20)

References (22)
  • 21
    • 33646407603 scopus 로고    scopus 로고
    • x at the Si surface. A similar GaN growth selectivity on AlN and Si has already been reported but without mentioning the role of the Si surface nitridation, see:
    • x at the Si surface. A similar GaN growth selectivity on AlN and Si has already been reported but without mentioning the role of the Si surface nitridation, see:. Tang H., Haffouz S., and Bardwell J.A. Appl. Phys. Lett. 88 (2006) 172110
    • (2006) Appl. Phys. Lett. , vol.88 , pp. 172110
    • Tang, H.1    Haffouz, S.2    Bardwell, J.A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.