Phase transitions in ultrathin Al films on Si(111) surfaces

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 73-75

  Groger R ^a   Von Blanckenhagen, P ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Aluminium; Electron diffraction; Phase transitions; Silicon

Indexed keywords

DEPOSITION; INTERFACES (MATERIALS); LOW ENERGY ELECTRON DIFFRACTION; MOLECULAR BEAM EPITAXY; MONOLAYERS; ORDER DISORDER TRANSITIONS; PHASE TRANSITIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SEMICONDUCTING SILICON; SURFACES; THERMAL EFFECTS; ULTRATHIN FILMS;

ALUMINIUM FILMS; BRAGG REFLEX INTENSITY; PYROLITHIC BORON NITRIDE; SPOT PROFILE ANALYSIS; ULTRAHIGH VACUUM;

ALUMINUM;

EID: 4244012937     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08578-1     Document Type: Article

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