Oxidation of PECVD SiNx thin films

Journal of Alloys and Compounds

Volumn 437, Issue 1-2, 2007, Pages 332-338

  Jehanathan, Neerushana ^a   Walmsley, Byron ^a   Liu, Yinong ^a   Dell, John ^a  

^a UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

Author keywords

Fourier transform infrared spectrometry; Photoelectron spectroscopies; Thin films; Transmission electron microscopy; Vapor deposition

Indexed keywords

FOURIER TRANSFORM INFRARED SPECTROSCOPY; HEAT TREATMENT; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

HEAT TREATMENT TEMPERATURES; OXIDATION CONVERSION; POST DEPOSITION TREATMENT;

THIN FILMS;

EID: 34247256877     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2006.08.004     Document Type: Article

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