Local bonding environment of plasma deposited nitrogen-rich silicon nitride thin films

Journal of Applied Physics

Volumn 97, Issue 9, 2005, Pages

  Soh, Martin T K ^a,b   Savvides, N ^b   Musca, Charles A ^a   Martyniuk, Mariusz P ^a   Faraone, Lorenzo ^a  

^a UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

^b CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

BIAXIAL MODULUS; OSCILLATOR PARAMETRIC ANALYSIS; STRESS CONTROLLABILITY;

BONDING; CONCENTRATION (PROCESS); ENVIRONMENTAL IMPACT; GROWTH (MATERIALS); INFRARED TRANSMISSION; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; THERMAL EFFECTS;

THIN FILMS;

EID: 18844409536     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1889236     Document Type: Article

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