Infrared ellipsometry investigation of SiOxNy thin films on silicon

Applied Optics

Volumn 35, Issue 25, 1996, Pages 4998-5004

  Brunet Bruneau, A ^a   Vuye, G ^a   Frigerio, J M ^a   Abeles F ^a   Rivory, J ^a   Berger, M ^b   Chaton, P ^b  

^a CNRS   (France)

^b CEA GRENOBLE   (France)

Author keywords

IR ellipsometry; Silicon oxynitrides; Vibration bands

Indexed keywords

EID: 0008044612     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.35.004998     Document Type: Article

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