Rapid thermal annealing of polysilicon thin films

Journal of Microelectromechanical Systems

Volumn 7, Issue 4, 1998, Pages 356-363

  Zhang, Xin ^a,b   Zhang, Tong Yi ^a   Wong, Man ^a   Zohar, Yitshak ^a  

^a HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Hong Kong)

^b NORTHEASTERN UNIVERSITY   (United States)

Author keywords

Polysilicon thin films; Rapid thermal annealing; Residual stress

Indexed keywords

CRYSTAL MICROSTRUCTURE; INDUCTION HEATING; POLYCRYSTALLINE MATERIALS; RAPID THERMAL ANNEALING; RESIDUAL STRESSES; THERMAL EFFECTS; THIN FILMS;

POLYSILICON THIN FILMS;

MICROELECTROMECHANICAL DEVICES;

EID: 0032293933     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.735342     Document Type: Article

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