Properties of ZnO/Cu/ZnO multilayer films deposited by simultaneous RF and DC magnetron sputtering at different substrate temperatures

Microelectronics Journal

Volumn 38, Issue 3, 2007, Pages 299-303

  Sahu, D R ^a   Huang, Jow Lay ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Electrical and optical properties; Multilayer; Sputtering; TCO

Indexed keywords

CONDUCTIVE FILMS; COPPER; DEPOSITION; MAGNETRON SPUTTERING; SUBSTRATES; ZINC OXIDE;

CONDUCTIVE MULTILAYER FILMS; SUBSTRATE TEMPERATURES; TRANSPARENT CONDUCTIVE ELECTRODES; TRANSPARENT CONDUCTIVE FILMS;

MULTILAYER FILMS;

EID: 34147169083     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2007.01.012     Document Type: Article

References (29)

1. Fahland M., Karlsson P., and Charton C. Thin Solid Films 392 (2001) 334
2. Tak Y.H., Kim K.B., Park H.G., Lee K.H., and Lee J.R. Thin Solid Films 411 (2002) 12
3. H.S. Ullal, K. Zwaibel, B. Von Roedern, in: Proceedings of the 29th IEEE Photovolatic Specialists Conference, 2002, p. 472.
4. Ali H.M., Mohamed H.A., and Mohamed S.H. Eur. Phys. J. Appl. Phys. 31 (2005) 87
5. Vanhest M.F.A.M., Dabney M.S., Perkins J.D., Ginley D.S., and Taylor M.P. Appl. Phys. Lett. 87 (2005) 32111
6. Hweewro J., and Guillen C. Thin Solid Films 451-452 (2004) 630
7. Jung Y.S., Choi Y.W., Lee H.C., and Lee D.W. Thin Solid Films 440 (2003) 278
8. Stollenwerk J., Ockler B., and Kretschmer K.H. Digest of SID-DMTC (1995) 111
9. Bender M., Seelig W., Daube C., Frankenberger H., Ocker B., and Stollenwerk J. Thin Solid Films 326 (1998) 72
10. Sawada M., Higuchi M., Kondo S., and Saka H. Jpn. J. Appl. Phys. 40 (2001) 3332
11. Sahu D.R., and Huang J.L. Appl. Surf. Sci. 252 (2006) 7509
12. Kloppel A., Kriegseis W., Meyer B.K., Scharmann A., Daube C., Stollenwerk J., and Trube J. Thin Solid Films 365 (2000) 139
13. Bender M., Seelig W., Daube C., Frankenberger H., Ocker B., and Stollenwerk J. Thin Solid Films 326 (1998) 67
14. Kloppel A., Meyer B., and Trube J. Thin Solid Films 392 (2001) 311
15. Dutta J., and Ray S. Thin Solid Films 162 (1988) 119
16. Fang G.J., Li D., and Yao B.L. Thin Solid Films 418 (2002) 156
17. Koss V., Bekkind A., Memarzadeh K., and Woollam J.A. Sol. Energy Mater. 19 (1989) 67
18. Sahu D.R., and Huang J.L. Appl. Surf. Sci. 253 (2006) 915
19. Ma J., Ji F., Ma H.L., and Li S.Y. Thin Solid Films 279 (1996) 213
20. Silver A.T., and Joubert J.C. Thin Solid Films 197 (1991) 195
21. Sagalowicz L., and Fox G.R. J. Mater. Res. 14 (1999) 1876
22. Sanon G., Rup R., and Mansingh A. Thin Solid Films 190 (1990) 287
23. Schuler T., and Aegerter M.A. Thin Solid Films 351 (1999) 125
24. Paraguay D.F., Estrada L.W., Acosta N.D.R., Andrade E., and Mikiyoshida M. Thin Solid Films 350 (1999) 192
25. Choi K.H., Kim J.Y., Lee Y.S., and Kim H.J. Thin Solid Films 341 (1999) 152
26. Dean P.J., Robbins D.J., Bishop S.G., savage J.a., and Porteous P. J. Phys. C: Solid State Phys. 14 (1981) 1847
27. Lin S.S., Huang J.L., and Li D.F. Surf. Coat. Technol. 186 (2004) 173
28. Lin S.S., and Hunag J.L. Surf. Coat. Technol. 85 (2004) 222
29. Haacke G. J. Appl. Phys. 47 (1976) 4086