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Volumn 67, Issue 1, 2007, Pages 39-47
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Measurements of density and sticking probability of CN(X2Σ+) radicals by laser-induced fluorescence spectroscopy
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Author keywords
Amorphous carbon nitride; Chemical vapor deposition (CVD); Plasma processing and deposition; Sticking probability
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Indexed keywords
CALIBRATION;
CARBON NITRIDE;
CHEMICAL VAPOR DEPOSITION;
DISCHARGE (FLUID MECHANICS);
FLUORESCENCE SPECTROSCOPY;
FREE RADICALS;
PLASMA DEPOSITION;
PROBABILITY DENSITY FUNCTION;
RAYLEIGH SCATTERING;
AMORPHOUS CARBON NITRIDE;
MICROWAVE DISCHARGE FLOW;
RAYLEIGH SCATTERING INTENSITY;
STICKING PROBABILITY;
DENSITY MEASUREMENT (OPTICAL);
CYANIDE;
FREE RADICAL;
ARTICLE;
CHEMISTRY;
EQUIPMENT DESIGN;
INSTRUMENTATION;
KINETICS;
LASER;
METHODOLOGY;
MICROWAVE RADIATION;
PHYSICAL CHEMISTRY;
PROBABILITY;
RADIATION SCATTERING;
SPECTROFLUOROMETRY;
CHEMISTRY, PHYSICAL;
CYANIDES;
EQUIPMENT DESIGN;
FREE RADICALS;
KINETICS;
LASERS;
MICROWAVES;
PROBABILITY;
SCATTERING, RADIATION;
SPECTROMETRY, FLUORESCENCE;
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EID: 33947640018
PISSN: 13861425
EISSN: None
Source Type: Journal
DOI: 10.1016/j.saa.2006.05.036 Document Type: Article |
Times cited : (9)
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References (38)
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