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Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 715-719

Sticking probability of the CN(X2Σ+) radicals onto the hydrogenated amorphous carbon nitride films

(3) Ito, Haruhiko a Oda, Kouichi a Saitoh, Hidetoshi a

a NAGAOKA UNIVERSITY OF TECHNOLOGY (Japan)

Author keywords

Amorphous carbon nitride; Chemical vapor deposition (CVD); Plasma processing and deposition

Indexed keywords

CARBON NITRIDE; CHEMICAL VAPOR DEPOSITION; DISSOCIATION; ELECTRIC EXCITATION; ELECTRON DENSITY MEASUREMENT; FLUORESCENCE; PROBABILITY; RAYLEIGH SCATTERING; SPECTROSCOPY;

AMORPHOUS CARBON NITRIDE FILMS; LASER INDUCED FLUORESCENCE (LIF) SPECTROSCOPY; MICROWAVE DISCHARGE FLOW; PLASMA PROCESSING AND DEPOSITION; RADICALS; STICKING PROBABILITY;

AMORPHOUS FILMS;

EID: 33645212879 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2005.08.146 Document Type: Article

Times cited : (3)

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