Capabilities of femtosecond laser ablation inductively coupled plasma mass spectrometry for depth profiling of thin metal coatings

Analytical Chemistry

Volumn 79, Issue 6, 2007, Pages 2325-2333

  Pisonero, J ^a   Koch, J ^a   Walle M ^a   Hartung, W ^a   Spencer, N D ^a   Gunther D ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; DISPERSIONS; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; LASER ABLATION; OPTICAL RESOLVING POWER; SUBSTRATES;

AEROSOL DISPERSIONS; FEMTOSECOND LASER ABLATION; SINGLE SHOT ANALYSIS; THIN METAL COATINGS;

COATINGS;

CHROMIUM; HELIUM; METAL; NICKEL;

ARTICLE; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; DIFFUSION; EVAPORATION; EXCIMER LASER; LASER; MASS SPECTROMETRY; MATERIAL COATING; SCANNING ELECTRON MICROSCOPY;

MASS SPECTROMETRY; METALS; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; TIME FACTORS;

EID: 33947377514     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac062027s     Document Type: Article

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