Glow discharge mass spectrometry

Analytical and Bioanalytical Chemistry

Volumn 381, Issue 1, 2005, Pages 173-188

  Hoffmann, Volker ^a   Kasik, Martin ^b   Robinson, Peter K ^c   Venzago, Cornel ^d  

^a IFW DRESDEN   (Germany)

^b Shiva Technologies Inc   (United States)

^c Mass Spectrometry International   (United Kingdom)

^d AQura GmbH   (Germany)

Author keywords

Depth profile; Fast flow; Glow discharge mass spectrometry; Pulse; Temperature

Indexed keywords

DATA REDUCTION; GLOW DISCHARGES; METALS; SEMICONDUCTOR MATERIALS; TRACE ELEMENTS;

ANALYTE MATERIALS; CONDUCTOR ANALYSIS; GLOW DISCHARGE MASS SPECTROMETRY (GDMS);

MASS SPECTROMETRY;

ACCURACY; ATOMIC ABSORPTION SPECTROMETRY; ELECTRODE; GLOW DISCHARGE MASS SPECTOMETRY; INTERMETHOD COMPARISON; MASS SPECTROMETRY; MOLECULAR PHYSICS; MONTE CARLO METHOD; PHYSICAL CHEMISTRY; QUALITY CONTROL; QUANTITATIVE ANALYSIS; QUANTITATIVE ASSAY; RELIABILITY; REVIEW; SEMICONDUCTOR; TEMPERATURE SENSITIVITY;

EID: 13844255805     PISSN: 16182642     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00216-004-2933-2     Document Type: Review

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