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Volumn 301-302, Issue SPEC. ISS., 2007, Pages 971-974
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Metamorphic growth of 1.25-1.29 μm InGaAs quantum well lasers on GaAs by molecular beam epitaxy
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Author keywords
A1. Metamorphic growth; A3. Molecular beam epitaxy; B2. Semiconducting III V materials; B3. Laser diodes
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Indexed keywords
EPILAYERS;
MOLECULAR BEAM EPITAXY;
MONOLAYERS;
SEMICONDUCTING INDIUM GALLIUM ARSENIDE;
SEMICONDUCTOR GROWTH;
SURFACE ROUGHNESS;
TRANSMISSION ELECTRON MICROSCOPY;
METAMORPHIC GROWTH;
OPTICAL QUALITY;
RIDGE WAVEGUIDE LASERS;
SEMICONDUCTING III-V MATERIALS;
QUANTUM WELL LASERS;
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EID: 33947306874
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2006.11.171 Document Type: Article |
Times cited : (34)
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References (14)
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