Atomic and electronic structure of amorphous and crystalline hafnium oxide: X-ray photoelectron spectroscopy and density functional calculations

Journal of Applied Physics

Volumn 101, Issue 5, 2007, Pages

  Perevalov, T V ^a   Gritsenko, V A ^a,e   Erenburg, S B ^b   Badalyan, A M ^b   Wong, Hei ^c   Kim, C W ^d  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^b NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^c CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^d Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^e TOMSK STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

BAND DATA; HAFNIUM OXIDES; IONIC GAPS; LOWER NARROW SUBBAND;

AMORPHOUS MATERIALS; CRYSTAL ATOMIC STRUCTURE; CRYSTALLINE MATERIALS; DENSITY FUNCTIONAL THEORY; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRONIC STRUCTURE; ENERGY GAP; X RAY PHOTOELECTRON SPECTROSCOPY;

HAFNIUM COMPOUNDS;

EID: 33947305102     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2464184     Document Type: Article

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