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Volumn 47, Issue 10, 2003, Pages 1651-1656

A new low voltage fast SONOS memory with high-k dielectric

Author keywords

EEPROM; FLASH; High k dielectrics; Silicon nitride; SONOS

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER SIMULATION; DIELECTRIC DEVICES; DYNAMIC RANDOM ACCESS STORAGE; PERMITTIVITY; PROM; ZIRCONIA;

EID: 0041592493     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(03)00174-6     Document Type: Conference Paper
Times cited : (83)

References (24)
  • 1
    • 0035872897 scopus 로고    scopus 로고
    • High-k dielectrics: Current status and materials properties considerations
    • Wilk G.D., Wallace R.M., Anthony J.M. High-. k dielectrics: current status and materials properties considerations J. Appl. Phys. 89:2001;5243-5275.
    • (2001) J. Appl. Phys. , vol.89 , pp. 5243-5275
    • Wilk, G.D.1    Wallace, R.M.2    Anthony, J.M.3
  • 3
    • 0003074482 scopus 로고    scopus 로고
    • Evolution of nonvolatile semiconductor memory: From floating-gate to single-electron memory cell
    • S. Luryi, J. Xu, & A. Zaslavsky. John Wiley & Sons
    • Sze S.M. Evolution of nonvolatile semiconductor memory: from floating-gate to single-electron memory cell. Luryi S., Xu J., Zaslavsky A. Future trends in microelectronics. 1999;John Wiley & Sons.
    • (1999) Future Trends in Microelectronics
    • Sze, S.M.1
  • 4
    • 0032271802 scopus 로고    scopus 로고
    • 0.13 μm MONOS single transistor memory cell with separated source lines
    • Fujiwara I., Aozasa H., Nakamura A., Hayashi Y. 0.13 μm MONOS single transistor memory cell with separated source lines. Pros. IEDM. 98(955):1998;36.7.1-36.7.4.
    • (1998) Pros. IEDM , vol.98 , Issue.955 , pp. 3671-3674
    • Fujiwara, I.1    Aozasa, H.2    Nakamura, A.3    Hayashi, Y.4
  • 6
    • 0035148013 scopus 로고    scopus 로고
    • Design considerations in scaled SONOS nonvolatile memory devices
    • Bu J., White M.H. Design considerations in scaled SONOS nonvolatile memory devices. Solid State Electron. 45:2001;113-117.
    • (2001) Solid State Electron. , vol.45 , pp. 113-117
    • Bu, J.1    White, M.H.2
  • 8
    • 0035498568 scopus 로고    scopus 로고
    • NROM - A new non-volatile memory technology: From device to product
    • Bloom I., Pavan P., Eitan B. NROM - a new non-volatile memory technology: from device to product. Microelectron. Eng. 59:2001;213-223.
    • (2001) Microelectron. Eng. , vol.59 , pp. 213-223
    • Bloom, I.1    Pavan, P.2    Eitan, B.3
  • 9
    • 0029409435 scopus 로고
    • High-endurance ultra-thin tunnel oxide in MONOS device structure for dynamic memory application
    • Wann H.C., Hu C. High-endurance ultra-thin tunnel oxide in MONOS device structure for dynamic memory application. IEEE Electron Dev. Lett. 16:1995;491-493.
    • (1995) IEEE Electron Dev. Lett. , vol.16 , pp. 491-493
    • Wann, H.C.1    Hu, C.2
  • 15
    • 9744236055 scopus 로고
    • Quantum model for phonon-assisted tunnel ionization of deep levels in a semiconductors
    • Makram-Ebeid S., Lannoo M. Quantum model for phonon-assisted tunnel ionization of deep levels in a semiconductors. Phys. Rev. B. 25:1982;6406-6424.
    • (1982) Phys. Rev. B , vol.25 , pp. 6406-6424
    • Makram-Ebeid, S.1    Lannoo, M.2
  • 17
    • 0042427107 scopus 로고
    • Electron and hole injection from metal in MNOS structures
    • Soviet, in Russian
    • Gritsenko V.A., Meerson E.E. Electron and hole injection from metal in MNOS structures. Microelectronics. 17:1988;249-255. (Soviet, in Russian).
    • (1988) Microelectronics , vol.17 , pp. 249-255
    • Gritsenko, V.A.1    Meerson, E.E.2
  • 18
    • 0000535841 scopus 로고    scopus 로고
    • 4 interface and energy band diagram of metal-nitride-oxide-semiconductor structures
    • 4 interface and energy band diagram of metal-nitride-oxide-semiconductor structures. Phys. Rev. B. 57:1997;R2081-R2083.
    • (1997) Phys. Rev. B , vol.57
    • Gritsenko, V.A.1    Meerson, E.E.2    Morokov, Yu.N.3
  • 22
    • 0035498454 scopus 로고    scopus 로고
    • Characterization of ulthrathin zirconium oxide films on silicon using photoelectron spectroscopy
    • Miyazaki S., Narasaki M., Ogasawara M., Hirose M. Characterization of ulthrathin zirconium oxide films on silicon using photoelectron spectroscopy. Microelectron. Eng. 59:2001;373-378.
    • (2001) Microelectron. Eng. , vol.59 , pp. 373-378
    • Miyazaki, S.1    Narasaki, M.2    Ogasawara, M.3    Hirose, M.4
  • 23
    • 36749106007 scopus 로고
    • Silicon nitride trap properties as revealed by charge-centroid measurements on MNOS devices
    • Arnett P.C., Yun B.H. Silicon nitride trap properties as revealed by charge-centroid measurements on MNOS devices. Appl. Phys. Lett. 26:1975;94-96.
    • (1975) Appl. Phys. Lett. , vol.26 , pp. 94-96
    • Arnett, P.C.1    Yun, B.H.2
  • 24
    • 0001663154 scopus 로고    scopus 로고
    • Excess silicon at the silicon nitride/thermal oxide interface in oxide-nitride-oxide structures
    • Gritsenko V.A., Wong H., Xu J.B., Kwok R.M., Petrenko I.P., Zaitsev B.A.et al. Excess silicon at the silicon nitride/thermal oxide interface in oxide-nitride-oxide structures. J. Appl. Phys. 86:1999;3234-3240.
    • (1999) J. Appl. Phys. , vol.86 , pp. 3234-3240
    • Gritsenko, V.A.1    Wong, H.2    Xu, J.B.3    Kwok, R.M.4    Petrenko, I.P.5    Zaitsev, B.A.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.