Reassessment of the molecular mechanisms for H2 thermal desorption pathways from Si(1-x)Gex(001)-(2×1) surfaces

Journal of Chemical Physics

Volumn 126, Issue 4, 2007, Pages

  Li, Qiang ^a   Tok, E S ^a   Zhang, J ^b   Chuan Kang, H ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; DENSITY FUNCTIONAL THEORY; REACTION KINETICS; SEMICONDUCTING SILICON; THERMAL DESORPTION;

GERMANIUM ATOMS; INTERDIMER CHANNELS; MEAN-FIELD APPROXIMATION; MOLECULAR MECHANISMS;

MOLECULAR DYNAMICS;

EID: 33847758265     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2432114     Document Type: Article

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