Hydrogen adsorption and desorption on SiGe investigated by in situ surface infrared spectroscopy

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 404-407

  Hirose, Fumihiko ^a   Sakamoto, Hitoshi ^a   Terashi, Miyako ^b   Kuge, Junko ^b   Niwano, Michio ^b  

^a MITSUBISHI HEAVY INDUSTRIES LTD   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Adsorption; Hydrogen; Infrared spectroscopy; SiGe; Surface adsorbate vibrations; Thermal desorption

Indexed keywords

ABSORPTION SPECTROSCOPY; ANNEALING; DESORPTION; EPITAXIAL GROWTH; GAS ADSORPTION; INFRARED SPECTROSCOPY; SILICON COMPOUNDS;

MULTIPLE INTERNAL REFLECTION GEOMETRY; SURFACE ADSORBATE VIBRATIONS; THERMAL DESORPTION;

THIN FILMS;

EID: 0032623790     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00124-8     Document Type: Article

References (15)

1. S.S. Iyer, G.L. Patton, J.M.C. Stork, B.S. Meyerson, S.L. Harame, IEEE Trans. Electron Devices 36 (1989) 2043.
2. E. Kasper, H. Kibbel, A. Gruhle, Thin Solid Films 222 (1992) 137.
3. J.S. Park, R.P.G. Karunasiriand, K.L. Wang, Appl. Phys, Lett. 60 (1992) 103.
4. B.S. Meyerson, K.J. Uram, F.K. Legouse, Appl. Phys. Lett, 60 (1992) 103.
5. S. Jan, R. Reif, Appl. Phys. Lest. 59 (1991) 3162.
6. P.M. Garone, J.C. Sturm, P.V. Schwartz, S.A. Schwarte, B.J. Wilkins, Appl. Phys. Lett. 56 (1990) 1275.
7. N.M. Russel, W.G. Breiland, J. Appl. Phys. 73 (1993) 3525.
8. M. Suemitsu, K. Kim, N. Miyamoto, J. Vac. Sci. Technol. A 12 (1994) 2271.
9. F. Hirose, H. Sakamoio, J. Vac, Sci. Technol. A 16 (1998) 2974.
10. N.J. Harrick, Internal Reflection Spectroscopy second printing (Harrick, Ossining, 1979), Wiley, New York, 1967.
11. Y.J. Chabal, Surf. Sci. Rep. 8 (1988) 211.
12. Y.J. Chabal, Surf. Sci. 168 (1986) 594.
13. M. Niwano, M. Terashi, J. Kuge, Appl. Surf. Sci. 130-132 (1598) 260.
14. M.-H. Xie, J. Zhang, A. Lees, J.M. Fernandes, B.A. Joyce, Surf. Sci. 367 (1996) 231,
15. N. Ohtani, S.M. Mokler, M.-H. Xie, J. Zhang, B.A. Joyce, Surf. Sci. 284 (1993) 305.