Translational heating of D2 molecules thermally desorbed from Si(100) and Ge(100) surfaces

Physical Review Letters

Volumn 89, Issue 8, 2002, Pages 086101/1-086101/4

  Sagara, T ^a   Kuga, T ^a   Tanaka, K ^a   Shibataka, T ^a   Fujimoto, T ^a   Namiki, A ^a  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ANNEALING; AUGER ELECTRON SPECTROSCOPY; DESORPTION; ELECTRON ENERGY LEVELS; HYDROGEN; MASS SPECTROMETRY; MOLECULAR VIBRATIONS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SURFACE PROPERTIES; TEMPERATURE PROGRAMMED DESORPTION;

HEATING RATE; QUADRUPOLE MASS SPECTROMETER; THERMOEQUILIBRIUM DESORPTION; TRANSLATIONAL HEATING;

MOLECULAR DYNAMICS;

EID: 0037135890     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.89.086101     Document Type: Article

References (33)