Preparation of indium tin oxide films by radio frequency magnetron sputtering under low vacuum level

Surface Review and Letters

Volumn 13, Issue 6, 2006, Pages 833-840

  Zhu, H B ^a   Li, X D ^a   Huang, S Y ^a   Jin, C X ^a   Sun, Z ^a   Chen, Y W ^a   Huang, S M ^a  

^a East China Normal University   (China)

Author keywords

Indium tin oxide; Radio frequency magnetron sputtering; Thin films; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS FILMS; MAGNETRON SPUTTERING; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; TIN COMPOUNDS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

INDIUM TIN OXIDE (ITO) THIN FILMS; RADIO FREQUENCY MAGNETRON SPUTTERING; WATER VAPOR DISSOCIATION;

OXIDE FILMS;

EID: 33847627992     PISSN: 0218625X     EISSN: None     Source Type: Journal    
DOI: 10.1142/S0218625X06008918     Document Type: Article

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