Thin film deposition by reactive magnetron sputtering: On the influence of target oxidation and its effect on surface properties

Thin Solid Films

Volumn 305, Issue 1-2, 1997, Pages 164-171

  Rohde, D ^a   Kersten, H ^a   Eggs, C ^a   Hippler, R ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

Author keywords

Thin film deposition; X ray photoelectron spectroscopy (XPS)

Indexed keywords

INDIUM COMPOUNDS; MAGNETRON SPUTTERING; OXIDATION; PLASMA DIAGNOSTICS; PLASMA INTERACTIONS; SUBSTRATES; SURFACE PHENOMENA; SURFACE STRUCTURE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

INDIUM TIN OXIDE; LANGMUIR PROBE DIAGNOSTICS;

CONDUCTIVE FILMS;

EID: 0031207692     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00157-0     Document Type: Article

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